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Composition control of radio-frequency magnetron sputter-deposited La_(0.5)Sr_(0.5)CoO_(3-partial deriv) thin films

机译:射频磁控溅射沉积La_(0.5)Sr_(0.5)CoO_(三部分导数)薄膜的成分控制

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摘要

For this paper, we used radio-frequency (rf) sputter deposition to synthesize epitaxial La_(0.5)Sr_(0.5)CoO_(3-partial deriv) (LSCO) films. We investigated the influence of sputter deposition parameters, in particular, oxygen partial pressure, plasma power, total sputter pressure, and post-deposition cooling atmosphere on film composition, microstructure, and electrical resistivity. We show that rf sputtering from a single target can produce LSCO films with La/Sr and (La + Sr)/Co ratios of unity and with low electrical resistivities of about 1 mΩcm. Film microstructures were characterized by high-resolution transmission electron microscopy and x-ray diffraction. Formation of an ordered film superlattice, most likely due to oxygen vacancy ordering, was observed. In this paper, we discuss the relationship between the film microstructure and the electrical resistivity.
机译:在本文中,我们使用了射频(rf)溅射沉积技术来合成外延La_(0.5)Sr_(0.5)CoO_(3-偏导)(LSCO)薄膜。我们研究了溅射沉积参数,特别是氧气分压,等离子功率,总溅射压力和沉积后冷却气氛对薄膜组成,微观结构和电阻率的影响。我们表明,从单个靶材进行射频溅射可以制备具有La / Sr和(La + Sr)/ Co之比为1且具有约1mΩcm的低电阻率的LSCO膜。薄膜的微观结构通过高分辨率透射电子显微镜和X射线衍射表征。观察到最有可能由于氧空位排序而形成有序的薄膜超晶格。在本文中,我们讨论了薄膜微结构与电阻率之间的关系。

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