Microstructure and chemistry of annealed Al-Cu-Fe-Cr quasicrystalline approximant coatings

摘要

An as-deposited Al-Cu-Fe-Cr film was annealed in flowing argon to study development of a quasicrystalline approximant microstructure. Sputter profile x-ray photoemission spectroscopy analysis showed oxygen incorporation reached approximately 70 at. percent at the surface of the film, declined monotonically, and stabilized at approx 10 at. percent at a depth of 160 nm. Synchrotron grazing incidence x-ray scattering was used to probe the structure of the coating at various penetration depths by altering the angle of the incident x-ray beam. An amorphous structure was observed near the termination surface, which coexisted with a compressively strained crystalline aluminum. These phases were the dominant microstructure to a depth of 110 nm. Below 150 nm, the film was primarily O_1 decagonal approximant. Cross-section transmission electron microscopy elucidated a columnar growth morphology with associated porosity in the interstices between the columns. The resulting development of the Al-Cu-Fe-Cr decagonal approximant coatings from the precursor is reported.