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Enhanced electrochromic properties of heat treated nanostructured tungsten trioxide thin films

机译:热处理的纳米结构三氧化钨薄膜的增强电致变色性能

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摘要

Nanostructured tungsten trioxide films were fabricated with the technique of glancing angle deposition (GLAD) in a thermal evaporation chamber with a base pressure of 1.3 × 10~(-4) Pa. Films were deposited at vapor incidence angles of 0°, 20°, 40°, and 50° with film thickness varying between 160 and 200 nm, as determined by spectroscopic eilipsometry. After deposition, samples were heated for 1 h in air at 400 ℃ and were subsequently intercalated with small amounts (5 to 15 nm) of lithium by dry lithiation, a technique developed in our laboratory. Compared with our previous work on as-deposited nanostructured films, these samples showed significantly enhanced coloration in the infrared region. It was found that the films exhibited an absorption-based coloration in the lower wavelengths as well as an increased reflection in the infrared region. Morphological investigation by atomic force microscopy (AFM) showed grain agglomeration and increased surface roughness upon heating. Our studies further indicate that grain agglomeration significantly contributes to the superior coloration properties of the films.
机译:利用掠角沉积(GLAD)技术在基本压力为1.3×10〜(-4)Pa的热蒸发室中制备纳米结构的三氧化钨薄膜。以0°,20°, 40分和50分,膜厚在160到200 nm之间变化,这是通过分光光度法测定的。沉积后,将样品在400℃的空气中加热1小时,然后通过干锂化将少量锂(5至15 nm)嵌入其中,这是我们实验室开发的技术。与我们先前对沉积的纳米结构薄膜的研究相比,这些样品在红外区域显示出显着增强的着色。发现该膜在较低波长下显示出基于吸收的着色,并且在红外区域中显示出增加的反射。通过原子力显微镜(AFM)进行的形态学研究表明,颗粒团聚并在加热时表面粗糙度增加。我们的研究进一步表明,颗粒团聚显着促进了薄膜的优异着色性能。

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