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Interfacial reactions between Sn-Cu solders and Ni-Co alloys at 250 ℃

机译:Sn-Cu焊料与Ni-Co合金在250℃下的界面反应

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摘要

Sn-xCu/Ni-yCo (x = 0.2-1.0 wt%, y = 10, 20, 40 at.%) interfacial reactions at 250 ℃ are examined in this study. Sn-Cu alloys are promising lead free solders, and Ni-Co alloys are the potential diffusion barrier layer materials in flip chip packaging. The Co and Cu effects on the Sn-Cu/Ni-Co interfacial reactions are examined. When the Co addition is 10 at.%, the reaction phases are the Ni_3Sn_4 and Cu_6Sn_5 phase, and Sn-Cu/Ni-10at.%Co interfacial reactions are similar to those of Sn-Cu/Ni. When the Co addition is 20 at.%, the CoSn_2 phase is formed, and the reaction path is Sn-Cu/Ni_3Sn_4/CoSn_2/Ni-20at.%Co. When the Co addition is 40 at.%, only Sn-Co binary phases are formed (CoSn_2 and CoSn_3), and Sn-Ni binary phases are not formed. The Cu_6Sn_5 phase is not formed until the Cu content is higher than 0.7 wt%. The Cu concentration effect is the main drawback of using Ni as the diffusion barrier layer material and the Sn-Cu solders. The Cu concentration effect of the Sn-Cu/Ni-Co interfacial reactions is not as pronounced as that of Sn-Cu/Ni.
机译:本研究研究了250℃下的Sn-xCu / Ni-yCo(x = 0.2-1.0 wt%,y = 10、20、40 at。%)界面反应。 Sn-Cu合金是有前途的无铅焊料,而Ni-Co合金是倒装芯片封装中潜在的扩散阻挡层材料。研究了Co和Cu对Sn-Cu / Ni-Co界面反应的影响。当Co的添加量为10原子%时,反应相为Ni_3Sn_4和Cu_6Sn_5相,并且Sn-Cu / Ni-10at。%Co的界面反应类似于Sn-Cu / Ni。当Co添加量为20原子%时,形成CoSn_2相,反应路径为Sn-Cu / Ni_3Sn_4 / CoSn_2 / Ni-20原子%Co。当Co添加量为40原子%时,仅形成Sn-Co二元相(CoSn_2和CoSn_3),并且不形成Sn-Ni二元相。直到Cu含量高于0.7wt%,才形成Cu_6Sn_5相。 Cu集中效应是使用Ni作为扩散阻挡层材料和Sn-Cu焊料的主要缺点。 Sn-Cu / Ni-Co界面反应的Cu浓度影响不如Sn-Cu / Ni明显。

著录项

  • 来源
    《Journal of Materials Research》 |2010年第7期|P.1321-1328|共8页
  • 作者单位

    R&D Center for Membrane Technology and Department of Chemical Engineering, Chung Yuan Christian University, Chung Li, Taiwan 32023;

    rnR&D Center for Membrane Technology and Department of Chemical Engineering, Chung Yuan Christian University, Chung Li, Taiwan 32023;

    rnR&D Center for Membrane Technology and Department of Chemical Engineering, Chung Yuan Christian University, Chung Li, Taiwan 32023;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

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