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首页> 外文期刊>Journal of Materials Research >Probing structural and chemical evolution in (Al_xGa_(1-x))_2O_3 using atom probe tomography: A review
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Probing structural and chemical evolution in (Al_xGa_(1-x))_2O_3 using atom probe tomography: A review

机译:探测(AL_XGA_(1-X))_ 2O_3使用原子探测断层扫描的结构和化学演化:审查

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摘要

(Al_xGa_(1-x))_2O_3 is a novel ultra-wide bandgap semiconductor with the potential to dominate future power electronics industries. High-performance devices demand high Al content in (Al_xGa_(1-x))_2O_3 but are limited by crystallinity degradation resulting from phase separation. Additionally, the solubility limit of Al is still under debate, and conclusive research is in progress. (Al_xGa_(1-x))_2O_3 is also limited in high-frequency applications owing to low carrier mobility and requires n-type doping. For commercializing this material, the major obstacle is understanding dopant's behavior in the host (Al_xGa_(1-x))_2O_3. To investigate these issues, an advanced characterization technique, atom probe tomography (APT), was employed to analyze the structural-chemical evolution of (Al_xGa_(1-x))_2O_3. In this review, we summarized our recent works on the structure-chemistry investigation of (Al_xGa_(1-x))_2O_3 with alloy composition and doping interaction. We introduced machine learning algorithms on APT data to reveal unrivaled knowledge, previously not achievable with conventional methodologies. The outstanding capabilities of APT to study (Al_xGa_(1-x))_2O_3 with Al composition and doping will be considered significant for the wide bandgap semiconductors community.
机译:(AL_XGA_(1-X))_ 2O_3是一种新型超宽带隙半导体,具有占据未来电力电子行业的潜力。高性能设备在(AL_XGA_(1-X))_ 2O_3中需要高AL含量,但是由相分离产生的结晶度降解限制。此外,Al的溶解度限制仍在辩论中,并正在进行确凿的研究。 (AL_XGA_(1-X))_ 2O_3由于低载波移动性并且需要n型掺杂而受到高频应用。为了将这种材料商业化,主要障碍是理解掺杂剂在主机中的行为(AL_XGA_(1-x))_ 2O_3。为了研究这些问题,采用先进的表征技术,原子探测断层扫描(APT)分析(AL_XGA_(1-X))_ 2O_3的结构化学演变。在本次审查中,我们总结了我们最近的作品(Al_xga_(1-x))_ 2O_3具有合金组成和掺杂相互作用的结构 - 化学研究。我们在APT数据上引入了机器学习算法,以揭示未实现的无与伦比的知识,以前不能与传统方法实现。对于宽带隙半导体群落,APT研究(AL_XGA_(1-X))_ 2O_3的突出功能将被视为显着。

著录项

  • 来源
    《Journal of Materials Research 》 |2021年第1期| 52-69| 共18页
  • 作者单位

    Department of Materials Design and Innovation University at Buffalo Buffalo New York 14260 USA;

    Department of Materials Design and Innovation University at Buffalo Buffalo New York 14260 USA;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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