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首页> 外文期刊>Journal of Materials Research >Reaction engineering of CVD methylammonium bismuth iodide layers for photovoltaic applications
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Reaction engineering of CVD methylammonium bismuth iodide layers for photovoltaic applications

机译:用于光伏应用的CVD甲基碘化铋铋层的反应工程

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摘要

In the past years, numerous alternative cations to replace Pb2+ in perovskite solar cells have been investigated. In terms of toxicity and chemical stability, methylammonium bismuth iodide [(CH3NH3)(3)Bi2I9 or MBI] containing the Bi3+ cation has been considered as a promising material. However, fabrication of coherent MBI films remains challenging. Recently, significant progress has been achieved by using vapor deposition processes. Compared with solution-processed ones, vapor-deposited MBI solar cells show higher fill factors and efficiencies. In this work, chemical vapor deposition (CVD) of MBI is investigated. Employing nitrogen as carrier gas, the precursors bismuth iodide (BiI3) and methylammonium iodide (MAI) are deposited sequentially over several cycles and form MBI during the process. In order to form dense and coherent layers, the lengths of the deposition cycles as well as the substrate temperature have been optimized. Scanning electron microscopy reveals the strong influence of both parameters on growth and crystal properties. Optimized films of MBI integrated into solar cells show that CVD of MBI is a promising method for fabricating large-area solar cells.
机译:在过去的几年中,已经研究了许多替代钙钛矿型太阳能电池中替代Pb2 +的阳离子。就毒性和化学稳定性而言,含Bi3 +阳离子的甲基碘化碘化铋铵[(CH3NH3)(3)Bi2I9或MBI]被认为是有前途的材料。然而,相干MBI膜的制造仍然具有挑战性。最近,通过使用气相沉积工艺已经取得了重大进展。与固溶处理的MBI太阳能电池相比,气相沉积的MBI太阳能电池具有更高的填充系数和效率。在这项工作中,对MBI的化学气相沉积(CVD)进行了研究。利用氮气作为载气,碘化铋(BiI3)和碘化甲基铵(MAI)的前驱物在多个循环中依次沉积,并在此过程中形成MBI。为了形成致密且连贯的层,已经优化了沉积循环的长度以及衬底温度。扫描电子显微镜揭示了两个参数对生长和晶体性质的强烈影响。集成到太阳能电池中的MBI的优化膜表明,MBI的CVD是一种用于制造大面积太阳能电池的有前途的方法。

著录项

  • 来源
    《Journal of Materials Research》 |2019年第4期|608-615|共8页
  • 作者单位

    Rhein Westfal TH Aachen, Compound Semicond Technol, D-52074 Aachen, Germany;

    Rhein Westfal TH Aachen, Compound Semicond Technol, D-52074 Aachen, Germany;

    Rhein Westfal TH Aachen, Compound Semicond Technol, D-52074 Aachen, Germany;

    Rhein Westfal TH Aachen, Compound Semicond Technol, D-52074 Aachen, Germany;

    Rhein Westfal TH Aachen, Compound Semicond Technol, D-52074 Aachen, Germany|AIXTRON SE, D-52134 Herzogenrath, Germany;

    APEVA SE, D-52134 Herzogenrath, Germany;

    Rhein Westfal TH Aachen, Compound Semicond Technol, D-52074 Aachen, Germany|AIXTRON SE, D-52134 Herzogenrath, Germany;

    Rhein Westfal TH Aachen, Compound Semicond Technol, D-52074 Aachen, Germany;

    Rhein Westfal TH Aachen, Compound Semicond Technol, D-52074 Aachen, Germany;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    chemical vapor deposition (CVD) (deposition); photovoltaic; surface reaction;

    机译:化学气相沉积(CVD)(沉积);光伏;表面反应;

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