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Subcooled Boiling of PF-5060 Dielectric Liquid on Microporous Surfaces

机译:PF-5060介电液在微孔表面上的过冷沸腾

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摘要

Presented are the results of experiments that investigated nucleate boiling of PF-5060 on microporous Cu surface layers at saturation and 10 K, 20 K, and 30 K subcooling. The three microporous layers, electrochemically deposited on 10 ×10 mm~2 Cu substrates and investigated herein, are —139 μm, 171 μm, and 220 μm thick. The critical heat flux increases linearly with increased subcooling, ΔT_(sub), at an average rate of 4.5%/K. For the 171 fim thick, Cu microporous surface, saturation boiling CHF of 27.8 W/cm~2 increases to 63.25 W/cm~2 at ΔT_(sub) =30 K, while the saturation h_(MNB) of 13.5 W/cm~2 K decreases slightly to 12.7 W/cm~2 K at ΔT_(sub)=30 K. The values of the surface superheat, ΔT_(sub), at h_(MNB) and CHF increase from 2.0 K and 2.16 K at saturation to 4.2 and 6.42 K at 30 K subcooling.
机译:提出的是在饱和和10 K,20 K和30 K过冷条件下研究PF-5060在微孔Cu表面层上的成核沸腾的实验结果。电化学沉积在10×10 mm〜2 Cu基板上并在本文中研究的三个微孔层的厚度分别为139μm,171μm和220μm。临界热通量随过冷度ΔT_(sub)的增加而线性增加,平均速率为4.5%/ K。对于171μm厚的Cu微孔表面,在ΔT_(sub)= 30 K时,饱和沸腾CHF从27.8 W / cm〜2增加到63.25 W / cm〜2,而饱和h_(MNB)为13.5 W / cm〜在ΔT_(sub)= 30 K时,2 K略微降低至12.7 W / cm〜2K。在h_(MNB)和CHF时,表面过热度ΔT_(sub)的值从饱和时的2.0 K和2.16 K增加到30 K过冷时为4.2和6.42K。

著录项

  • 来源
    《Journal of Heat Transfer》 |2011年第8期|p.081503.1-081503.8|共8页
  • 作者

    Mohamed S. El-Genk; Amir F. AM;

  • 作者单位

    Regents' Professor and Founding Director of Institute for Space and Nuclear Power Studies,Department of Chemical and Nuclear Engineering Department of Mechanical Engineering,University of New Mexico,Albuquerque, NM 87131-0001;

    Department of Mechanical Engineering and Institute for Space and Nuclear Power Studies,University of New Mexico, Albuquerque, NM 87131-0001;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    subcooled boiling; microporous copper; electrochemical deposition; elec-tronic cooling; dielectric liquids;

    机译:过冷沸腾微孔铜电化学沉积电子冷却;介电液体;
  • 入库时间 2022-08-18 00:25:36

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