Molecular-Beam Epitaxial Growth of HgCdTe Infrared Focal-Plane Arrays on Silicon Substrates for Midwave Infrared Applications

摘要

Molecular beam epitaxy has been employed to deposit HgCdTe infrared detector structures on Si(112) substrates with performance at 125K that is equivalent to detectors grown on conventional CdZnTe substrates. The detector structures are grown on Si via CdTe(112)B buffer layers, whose structural properties include x-ray rocking curve full width at half maximum of 63 arc-sec and near-surface etch pit density of 3-5 x 10~5 cm~-2 for 9 μm thick CdTe films. HgCdTe p+-on-n device structures were grown by molecular beam epitaxy (MBE) on both bulk CdZnTe and Si with 125K cutoff wavelengths ranging from 3.5 to 5 μm. External quantum efficiencies of 70/100, limited only by reflection loss at the uncoated Si- vacuum interface, were achieved for detectors on Si. The current-voltage (I-V) characteristics of MBE-grown detectors on CdZnTe and Si were found to be equivalent, with reverse breakdown voltages well in excess of 700 mV. The temperature dependences of the I-V characteristics of MBE-grown diodes on CdZnTe and Si were found to be essentially identical and in agreement with a diffusion-limited current model for temperatures down to 110K. The perfor- mance of MBE-grown diodes on Si is also equivalent to that of typical liquid phase epitaxy-grown devices on CdZnTe with R_0A products in the 10~6-10~7 Ω-cm2 range for 3.6 μm cutoff at 125K and R_0A products in the 10~4-10~5 Ω-cm~2 range for 4.7 μm cutoff at 125K.