首页> 外文期刊>Journal of Crystal Growth >Observations of initial growth stage of epitaxial Pb(Zr_,Ti)O_3 thin films on SrTiO_3(1 0 0) substrate by MOCVD
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Observations of initial growth stage of epitaxial Pb(Zr_,Ti)O_3 thin films on SrTiO_3(1 0 0) substrate by MOCVD

机译:MOCVD法观察SrTiO_3(1 0 0)衬底上外延Pb(Zr_,Ti)O_3薄膜的初始生长阶段

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The initial stage of the metalorganic chemical vapor deposition growth of epitaxial Pb(Zr,Ti)O_3 (PZT) thin films on SrTiO_3(1 0 0) (STO) single-crystal substrates was observed using scanning probe microscopy (SPM). Both annealed and etched STO substrates showed flat surfaces with 100-300 nm wide terraces and atomic-layered steps. SPM observations revealed that the surface of annealed STO substrates was composed of either SrO or TiO_2-terminated terraces and that etched STO substrates consisted of only the TiO_2-terminated surface. PZT films showed the Volmer-Weber (V-M) and Stranski-Krastanov (S-K) growth modes on the SrO and TiO_2-terminated surfaces of STO substrates, respectively.
机译:利用扫描探针显微镜(SPM)观察了外延Pb(Zr,Ti)O_3(PZT)薄膜在SrTiO_3(1 0 0)(STO)单晶衬底上的金属有机化学气相沉积生长的初始阶段。退火和蚀刻的STO基板均显示平坦表面,具有100-300 nm宽的平台和原子层台阶。 SPM观察表明,退火过的STO基板的表面由SrO或TiO_2端接的平台组成,而蚀刻的STO基板仅由TiO_2端接的表面组成。 PZT膜分别在STO衬底的SrO和TiO_2端基表面上显示了Volmer-Weber(V-M)和Stranski-Krastanov(S-K)生长模式。

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