首页> 外文期刊>Journal of Crystal Growth >Study on silicon melt convection during the RF-FZ crystal growth process II. numerical investigation
【24h】

Study on silicon melt convection during the RF-FZ crystal growth process II. numerical investigation

机译:RF-FZ晶体生长过程中硅熔体对流的研究II。数值研究

获取原文
获取原文并翻译 | 示例
       

摘要

Silicon melt convection during the floating zone (FZ) crystal growth process under radio-frquency (RF) heating and the effect of the externally applied magnetic filed on the RF-FZ silicon melt convction have been investigated numerically. The main purpose of the study is to clarify the characteristics of the silicon melt convection under the RF heating and the effect of externally applied magnetic field on such melt convection. The unmerically obtained flow characteristics are almost the same as previously reported experimental results.
机译:数值研究了在射频(RF)加热下浮区(FZ)晶体生长过程中的硅熔体对流以及外部施加的磁场对RF-FZ硅熔体对流的影响。该研究的主要目的是弄清射频加热下硅熔体对流的特性以及外加磁场对该熔体对流的影响。单体获得的流动特性与先前报道的实验结果几乎相同。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号