机译:MBE生长的Heusler合金Ni_2MnIn与(001)InAs或InAs-HEMT结构之间的界面混合的抑制
Institute of Applied Physics, University of Hamburg, Jungiusstr. 11,20355 Hamburg, Germany;
Institute of Applied Physics, University of Hamburg, Jungiusstr. 11,20355 Hamburg, Germany;
GKSS Research Centre, Max-Planck-Strafie I, 21502 Geesthacht, Germany,;
GKSS Research Centre, Max-Planck-Strafie I, 21502 Geesthacht, Germany,;
Institute of Physical Chemistry, University of Hamburg, Grindelaliee 117, 20146 Hamburg, Germany;
Institute of Applied Physics, University of Hamburg, Jungiusstr. 11,20355 Hamburg, Germany;
Institute of Applied Physics, University of Hamburg, Jungiusstr. 11,20355 Hamburg, Germany;
Institute of Applied Physics, University of Hamburg, Jungiusstr. 11,20355 Hamburg, Germany;
A1. Interfaces; A3. Molecular beam epitaxy; B1. Heusler alloys; B3. Spintronics;
机译:生长温度对InAs(001)上Ni_2MnIn Heusler膜中相和混合的影响
机译:Ni_2MnIn Heusler薄膜的结构和磁性能,该薄膜在变质缓冲的掺杂InAs异质结构上生长
机译:Heusler合金Co2FeSi / GaAs(001)杂化结构的生长温度依赖性界面反应
机译:静脉温度效应Ni_2mnin基的Heusler合金中的逆mce,在室温附近
机译:晶格 - 失配GaAs(001)的应变弛豫机制和界面缺陷的研究 - 基于异质结构
机译:通过离子束溅射获得和掺杂InAs-QD / GaAs(001)纳米结构
机译:Heusler合金Co2Tisi / Gaas(001)混合结构中的垂直磁各向异性