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机译:改性MOCVD沉积Bi_2Te_3薄膜的生长和热电性能
Department of Materials Science and Engineering, Seoul National University, Seoul 151-744, Republic of Korea Electronic Materials Center, Korea Institute of Science and Technology (KIST), Seoul 136-791, Republic of Korea;
Electronic Materials Center, Korea Institute of Science and Technology (KIST), Seoul 136-791, Republic of Korea;
School of Electrical and Engineering, Yonsei University, Seoul 120-749, Republic of Korea;
Department of Materials Science and Engineering, Seoul National University, Seoul 151-744, Republic of Korea;
Electronic Materials Center, Korea Institute of Science and Technology (KIST), Seoul 136-791, Republic of Korea;
Department of Materials Science and Engineering, Seoul National University, Seoul 151-744, Republic of Korea Research Institute of Advanced Materials (RIAM), Seoul National University, Seoul 151-744, Republic of Korea;
A1. Growth mechanism; A3. Metal organic chemical vapor; deposition (MOCVD); B1. Bismuth telluride (Bi_2Te_3); B2. Thermoelectric materials;
机译:热共蒸发沉积Bi_2Te_3薄膜的热电性能优化
机译:热辅助溅射法沉积热电模块的p型Sb_2Te_3和n型Bi_2Te_3薄膜
机译:气溶胶-紫外光辅助MOCVD沉积掺b非晶铝氧化钇薄膜的生长及性能
机译:MBE Bi_2Te_3薄膜的生长和热电性能
机译:通过MOCVD沉积的低温III族氮化物薄膜的原位和生长后研究。
机译:富含富含型和Zn的生长条件下ALD沉积的薄ZnO膜的结构性质及其与电参数的关系
机译:生长参数对MOCVD沉积的TiO2薄膜的影响生长参数对MOCVD沉积的TiO2薄膜的影响
机译:mOCVD生长Znsb薄膜的热电性能