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On reliable modeling of substrate/buffer loading effects in a gallium nitride high-electron-mobility transistor on silicon substrate

机译:硅衬底上氮化镓高电子 - 迁移率晶体管中基板/缓冲效应的可靠建模

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Currently, gallium nitride (GaN) on silicon (Si) high-electron-mobility transistors (HEMT) are a promising candidate for designing improved power electronic circuits. The lattice mismatch between GaN and Si induces buffer/substrate leakage currents that impact the performance of the device. In this paper, four different model topologies have been demonstrated to simulate the buffer/substrate loading effect in GaN on a Si HEMT. A particle swarm optimization-based procedure has been developed to extract reliable values for the model elements. The models are evaluated in term of reliability of extraction and accuracy of S-parameter fitting. The results showed that the RC-based model topologies have more accurate simulation for buffer/substrate leakage than the RLC-based topology. This will contribute to reliable and accurate small-/large-signal modeling of the device for designing efficient power circuits.
机译:目前,硅(Si)高电子 - 迁移率晶体管(HEMT)上的氮化镓(GaN)是用于设计改进的电力电子电路的有希望的候选者。 GaN和Si之间的晶格错配诱导冲击器件性能的缓冲器/基板泄漏电流。在本文中,已经证明了四种不同的模型拓扑结构在Si HEMT上模拟GaN中的缓冲液/基材负载效果。已经开发了一种基于粒子群优化的过程,以提取模型元素的可靠值。在S参数配件的提取和精度的可靠性方面评估模型。结果表明,基于RC的模型拓扑具有比基于RLC的拓扑结构更精确的缓冲/衬底泄漏模拟。这将有助于为设计有效电源电路的设备可靠和准确的小/大信号建模。

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