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Surface and Grain‐Boundary Diffusion of Gold‐Copper

机译:金铜的表面和晶界扩散

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摘要

The diffusion of gold into copper grain boundaries from thin sources has been studied from 760° to 625°C. The activation energy for the grain‐boundary diffusion of gold into copper is 25 kcal/mole. At the lower temperature, there was observed surface depletion of gold at the grain boundary in accordance with theoretical solutions. The surface diffusion of gold on copper (100) surface was studied from 705° to 580°C under 10-9 Torr. The activation energy for surface diffusion was about 25 kcal/mole. The rates of surface diffusion were found to be less than those for grain‐boundary diffusion at the same temperature. Gold‐copper whiskers were generated adjacent to the grain boundaries for diffusion at or below 660°C. The growth of such whiskers is diffusion‐controlled and is attributed to the stress resulting from volume increase due to gold diffusion into the grain boundary.
机译:已经研究了从760°到625°C的金从薄源到铜晶界的扩散。金向铜的晶界扩散的活化能为25 kcal / mol。在较低温度下,根据理论解观察到金在晶界处的表面耗尽。研究了金在10-9托下从705°C到580°C在铜(100)表面上的表面扩散。表面扩散的活化能为约25kcal /摩尔。发现在相同温度下,表面扩散速率小于晶界扩散速率。在晶界附近产生金铜晶须,以便在660°C或更低的温度下扩散。这种晶须的生长是受扩散控制的,并且归因于由于金扩散到晶界中而引起的体积增加所产生的应力。

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    《Journal of Applied Physics》 |1966年第10期|共9页
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  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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