Sputtering Experiments with 1‐ to 5‐keV Ar+ Ions. II. Monocrystalline Targets of Al, Cu, and Au

摘要

Sputtering yields have been measured during normally incident 1‐ to 5‐keV Ar+ ion irradiation of polycrystalline Au, 〈100〉, 〈110〉, and 〈111〉 Au monocrystals, a 〈111〉 Al monocrystal, and several 〈0kl〉 Cu monocrystals of previously unreported orientations. Onderdelinden''s transparency model is found to account satisfactorily for the orientation dependence of the yields of low‐index Cu, Au, and Ge crystals. The importance of the recording geometry in governing the appearance of sputtering ejection patterns is demonstrated. The so‐called 〈114〉 ejection‐pattern spots from 〈111〉 fcc crystals are attributed to assisted focusing sequences along 〈100〉, the most probable ejection direction being shifted because the last focusing ``lens'''' is incomplete.