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A semi-analytical model for laser induced densification in fused silica at elevated temperatures

机译:熔融二氧化硅激光诱导致密化的半分析模型

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摘要

A semi-analytical model for deterministic surface smoothing of fused silica below the evaporation temperature threshold is presented. Using this model, a method for calculating deterministic track depths for laser polishing fused silica is derived and validated with experiments. Model predictions were in good agreement with experiment across varying laser preheating temperature and power. With the semi-analytical method presented here, deterministic laser smoothing can be achieved in the densification regime to close the process loop of laser polishing.
机译:介绍了熔融二氧化硅的确定性表面平滑的半分析模型,低于蒸发温度阈值。 使用该模型,通过实验导出并验证了用于计算激光抛光熔融二氧化硅的确定性轨道深度的方法。 模型预测与不同激光预热温度和功率的实验非常一致。 利用此处呈现的半分析方法,可以在致密化状态下实现确定性激光平滑,以关闭激光抛光的过程回路。

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  • 来源
    《Journal of Applied Physics》 |2021年第11期|115302.1-115302.9|共9页
  • 作者单位

    Lawrence Livermore National Laboratory Livermore California 94550 USA Mechanical Engineering Department University of Rochester Rochester New York 14626 USA;

    Lawrence Livermore National Laboratory Livermore California 94550 USA;

    Lawrence Livermore National Laboratory Livermore California 94550 USA;

    Lawrence Livermore National Laboratory Livermore California 94550 USA;

    Lawrence Livermore National Laboratory Livermore California 94550 USA;

    Edmund Optics Barrington New Jersey 08007 USA;

    Clerio Vision Inc. Rochester New York 14618 USA;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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