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Electronic density of states engineering of a 3D 14 nm Si/Ge alloy metalattice

机译:3D 14 NM Si / GE合金熔融的电子密度

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摘要

Si/Ge nanostructures have attracted much attention since they are compatible with current microelectronics technology. The geometry and composition variations can be used to tune their electronic properties. Here, we introduce a 3D Si/Ge superlattice, metalattice, made of more volumetric meta-atoms and thinner metabonds between them. Its size varies from a few tens to hundreds of nanometers and can be taken as a mesoscale physics platform. We intend to bring a metallic character to such an alloy metalattice. This requires that the quantum confinement and chemical composition act in a complementary way. The tight-binding method is employed and it is confirmed that a 3D uniform density of states across the whole metalattice is possible. Search for the preferred electronic structure now transforms to the problem of finding the appropriate geometry.
机译:Si / Ge纳米结构引起了很多关注,因为它们与当前的微电子技术兼容。几何和组成变化可用于调谐其电子特性。在这里,我们介绍了一个3D Si / Ge超晶格,MetalAgTice,由更多的体积元原子和它们之间的更薄的代码制成。其大小从几十到数百纳米的大小不同,并且可以作为Mescreal物理平台。我们打算将金属特性带到这样的合金熔体。这要求量子限制和化学成分以互补的方式行动。采用紧密结合方法,确认整个熔化的态的3D均匀密度是可能的。搜索首选的电子结构现在转换为找到适当的几何体的问题。

著录项

  • 来源
    《Journal of Applied Physics》 |2020年第5期|054302.1-054302.8|共8页
  • 作者

    ZhaoHui Huang; RanXin Wang;

  • 作者单位

    Materials Research Institute The Pennsylvania State University University Park Pennsylvania 16802 USA;

    Inner Mongolia Environmental Online Monitoring Center Hohhot 010020 People's Republic of China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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