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首页> 外文期刊>Journal of Applied Physics >High-speed dynamics of temperature distribution in ultrafast (up to 10~8 K/s) chip-nanocalorimeters, measured by infrared thermography of high resolution
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High-speed dynamics of temperature distribution in ultrafast (up to 10~8 K/s) chip-nanocalorimeters, measured by infrared thermography of high resolution

机译:超快温度分布的高速动力学(最多10〜8 k / s)芯片纳米百分比计,通过高分辨率红外热成像测量

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摘要

To study the kinetics of phase transitions and to obtain artificial materials with improved physical properties, a set of thin-film high-sensitivity sensors for ultra-fast scanning nanocalorimetry has been constructed. To investigate the dynamics of the temperature distribution in thin-film calorimetric sensors, high-resolution high-speed infrared thermography has been applied as a tool of non-contact thermal imaging in combination with ultra-fast scanning calorimetry. The dynamic heat-transfer problem, causing the temperature distribution in a thin-film sensor at ultrafast scanning of temperature, has been solved analytically. Analytical solutions for square and circular geometry have been obtained and compared with the temperature profiles obtained by infrared thermographic measurements. A theoretical background for ultra-fast-cooling experiments has been formulated. The origin of the restrictions imposed on the maximum attainable controlled cooling rate has been investigated. It is shown that thin-film sensors can be applied for controlled ultra-fast cooling, as well as heating, at 10(8) K/s and even 10(9) K/s.
机译:为了研究相转变的动力学并获得具有改进的物理性质的人造材料,构造了一组用于超快速扫描纳米粉状的薄膜高灵敏度传感器。为了研究薄膜量热传感器中温度分布的动力学,高分辨率高速红外热成像已作为非接触热成像的工具与超快速扫描量热法相结合。动态传热问题,在超快扫描温度下导致薄膜传感器中的温度分布,已经在分析上求解。已经获得了用于方形和圆形几何的分析解,并与红外热成像测量获得的温度曲线进行比较。制定了超快速冷却实验的理论背景。研究了对最大可获得的控制冷却速率施加的限制的起源。结果表明,薄膜传感器可以应用于控制的超快速冷却,以及加热,10(8)k / s甚至10(9)k / s。

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  • 来源
    《Journal of Applied Physics》 |2019年第5期|054501.1-054501.15|共15页
  • 作者单位

    RAS Prokhorov Gen Phys Inst GPI Vavilov Str 38 Moscow 119991 Russia;

    Tokyo Inst Technol Sch Mat & Chem Technol Tokyo 1528552 Japan;

    Univ Rostock Inst Phys Albert Einstein Str 23-24 D-18051 Rostock Germany|Univ Rostock Competence Ctr CALOR Albert Einstein Str 23-24 D-18051 Rostock Germany;

    Tokyo Inst Technol Sch Mat & Chem Technol Tokyo 1528552 Japan;

    Xensor Integrat Distributieweg 28 NL-2645 EJ Delfgauw Netherlands;

    Univ Rostock Inst Phys Albert Einstein Str 23-24 D-18051 Rostock Germany|Univ Rostock Competence Ctr CALOR Albert Einstein Str 23-24 D-18051 Rostock Germany|Kazan Fed Univ Kremlyovskaya Str 18 Kazan 420008 Russia|Tokyo Inst Technol Sch Mat & Chem Technol Tokyo Tech World Res Hub Initiat WRHI Tokyo Japan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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