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Tin-based donors in SiSn alloys

机译:SiSn合金中的锡基施主

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摘要

Tin-containing Group IV alloys show great promise for a number of next-generation CMOS-compatible devices. Not least of those are optoelectronic devices such as lasers and light-emitting diodes. To obtain reliable operation, a high control over the doping in such materials is needed at all stages of device processing. In this paper, we report tin-based donors in silicon, which appear after heat treatment of a silicon-tin alloy at temperatures between 650 degrees C and 900 degrees C. Two stages of the donor are observed, called SD I and SD II, which are formed subsequently. A broad long-lifetime infrared photoluminescence is also observed during the first stages of donor formation. We discuss evolving tin clusters as the origin of both the observed donors and the photoluminescence, in analogy to the oxygen-based thermal donors in silicon and germanium.
机译:含锡的第IV组合金对许多下一代CMOS兼容器件具有广阔的前景。其中最重要的是光电器件,例如激光器和发光二极管。为了获得可靠的操作,在器件加工的所有阶段都需要对此类材料中的掺杂进行高度控制。在本文中,我们报告了硅中的锡基施主,它是在650摄氏度至900摄氏度之间的温度下对硅锡合金进行热处理后出现的。观察到施主的两个阶段,即SD I和SD II,随后形成的。在供体形成的第一阶段,也观察到了广泛的长寿命红外光致发光。我们讨论了不断演变的锡簇,作为观察到的施主和光致发光的起源,类似于硅和锗中基于氧的热施主。

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  • 来源
    《Journal of Applied Physics》 |2019年第3期|035702.1-035702.7|共7页
  • 作者单位

    Aarhus Univ, Dept Phys & Astron, Ny Munkegade 120, DK-8000 Aarhus C, Denmark;

    Aarhus Univ, Dept Phys & Astron, Ny Munkegade 120, DK-8000 Aarhus C, Denmark;

    Aarhus Univ, Dept Phys & Astron, Ny Munkegade 120, DK-8000 Aarhus C, Denmark|Aarhus Univ, Interdisciplinary Nanosci Ctr iNano, Gustav Wieds Vej 14, DK-8000 Aarhus C, Denmark;

    Aarhus Univ, Dept Phys & Astron, Ny Munkegade 120, DK-8000 Aarhus C, Denmark;

    Aarhus Univ, Dept Phys & Astron, Ny Munkegade 120, DK-8000 Aarhus C, Denmark|Aarhus Univ, Interdisciplinary Nanosci Ctr iNano, Gustav Wieds Vej 14, DK-8000 Aarhus C, Denmark;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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