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首页> 外文期刊>Journal of Applied Physics >Complex quantum dot arrays formed by combination of self-organized anisotropic strain engineering and step engineering on shallow patterned substrates
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Complex quantum dot arrays formed by combination of self-organized anisotropic strain engineering and step engineering on shallow patterned substrates

机译:通过将自组织各向异性应变工程和台阶工程结合在浅图案化基板上形成的复杂量子点阵列

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摘要

One-dimensional (In,Ga)As quantum dot (QD) arrays are created on planar singular, vicinal, and shallow mesa-patterned GaAs (100) substrates by self-organized anisotropic strain engineering of an (In,Ga)As/GaAs quantum wire (QWR) superlattice template in molecular beam epitaxy. On planar singular substrates, highly uniform single QD arrays along [0-11] are formed. On shallow [0-11] and [011] stripe-patterned substrates, the generated type-A and -B steps distinctly affect the surface migration processes which are crucial for QWR template development, i.e., strain-gradient-driven In adatom migration along [011] and surface-reconstruction-induced Ga/In adatom migration along [0-11]. In the presence of both type-A and -B steps on vicinal substrates misoriented towards [101], the direction of adatom migration is altered to rotate the QD arrays. This establishes the relationship between self-organized anisotropic strain and step engineering, which is exploited on shallow zigzag-patterned substrates for the realization of complex QD arrays and networks with well-positioned bends and branches, exhibiting high structural and optical quality.
机译:通过(In,Ga)As / GaAs的自组织各向异性应变工程在平面奇异,邻域和浅台面图案GaAs(100)衬底上创建一维(In,Ga)As量子点(QD)阵列分子束外延中的量子线(QWR)超晶格模板。在平面奇异基板上,沿着[0-11]形成高度均匀的单个QD阵列。在浅[0-11]和[011]条纹图案的基材上,生成的A型和-B型台阶明显影响表面迁移过程,这对于QWR模板开发至关重要,即应变梯度驱动的In原子迁移沿[011]和表面重建诱导的Ga / In原子沿[0-11]迁移。如果在朝向[101]方向不正确的邻近基质上同时存在A型和B型台阶,则改变原子迁移的方向以旋转QD阵列。这建立了自组织各向异性应变与阶梯工程之间的关系,该关系在浅Z字形图案的基板上被利用,以实现复杂的QD阵列和具有良好定位的弯曲和分支的网络,具有较高的结构和光学质量。

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