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首页> 外文期刊>Journal of Applied Physics >Correlation of edge roughness to nucleation field and nucleation field distribution in patterned Permalloy elements
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Correlation of edge roughness to nucleation field and nucleation field distribution in patterned Permalloy elements

机译:图案化坡莫合金元件中边缘粗糙度与形核场和形核场分布的相关性

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The effects of edge roughness on vortex nucleation field and its distribution are measured in Permalloy nanostructured arrays. Teardrop-shaped elements, 250 nm wide and 30 nm thick, were fabricated using electron beam lithography and lift-off. Roughness variations were created by varying the electron dose during patterning, and measured by analysis of in-focus transmission electron microscopy (TEM) images. In situ measurements of the vortex nucleation fields and the nucleation field distributions of the dose arrays were performed with Lorentz mode TEM. In combining the measurements of edge roughness with measurements of nucleation field and its distribution, we show that edge roughness increases the probability for vortex nucleation and thus permits vortices to nucleate at larger applied fields, but at the same time, edge roughness broadens the nucleation-field distribution in magnetic nanostructured arrays.
机译:在坡莫合金纳米结构阵列中测量了边缘粗糙度对涡流形核场及其分布的影响。使用电子束光刻和剥离技术制造了宽250 nm,厚30 nm的泪滴形元件。粗糙度变化是通过在构图期间改变电子剂量而产生的,并通过分析聚焦透射电子显微镜(TEM)图像进行测量。使用Lorentz模式TEM对剂量阵列的涡流形核场和形核场分布进行原位测量。将边缘粗糙度的测量结果与成核场及其分布的测量结果结合起来,我们发现边缘粗糙度增加了涡旋形核的可能性,因此允许涡旋在更大的应用场中形核,但同时,边缘粗糙度扩大了形核-磁性纳米结构阵列中的磁场分布。

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