Formation of (Ti, AI)N/Ti_2AIN multilayers after annealing of TiN/TiAI(N) multilayers deposited by ion beam sputtering

V. Dolique; M. Jaouen; T. Cabioch; F. Pailloux; Ph. Guerin; V. Pelosin

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Formation of (Ti, AI)N/Ti_2AIN multilayers after annealing of TiN/TiAI(N) multilayers deposited by ion beam sputtering

机译：通过离子束溅射沉积的TiN / TiAI（N）多层退火后形成（Ti，AI）N / Ti_2AIN多层

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By using ion beam sputtering, TiN/TiAl(N) multilayers of various modulation wavelengths (A = 8, 13, and 32 nm) were deposited onto silicon substrates at room temperature. After annealing at 600 ℃ in vacuum, one obtains for A= 13 nm a (Ti, Al)N/Ti_2AlN mul

机译：通过使用离子束溅射，在室温下将各种调制波长（A = 8、13和32 nm）的TiN / TiAl（N）多层沉积到硅基板上。在真空中于600℃退火后，获得A = 13 nm的a（Ti，Al）N / Ti_2AlN mul

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来源
《Journal of Applied Physics》 |2008年第8期|407-416|共10页
作者
V. Dolique; M. Jaouen; T. Cabioch; F. Pailloux; Ph. Guerin; V. Pelosin;
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收录信息美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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2. Thermally induced formation of SiC nanoparticles from Si/C/Si multilayers deposited by ultra-high-vacuum ion beam sputtering [J] . Chung CK, Wu BH Nanotechnology . 2006,第13期

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4. Formation of Luminescent Si Nanocrystals by High-Temperature Annealing of Ion-Beam-Sputtered Si/SiO_2 Multilayers [C] . Suk-Ho Choi, Jun Sung Bae, Kyung Jung Kim, Materials Research Society Symposium . 2003

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6. Fretting Wear Behavior and Photoelectron Spectroscopy (XPS) Analysis of a Ti/TiN Multilayer Film Deposited on Depleted Uranium [O] . Shengfa Zhu, Yanping Wu, Zhengyang Li, 2018

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Formation of (Ti, AI)N/Ti_2AIN multilayers after annealing of TiN/TiAI(N) multilayers deposited by ion beam sputtering

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