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首页> 外文期刊>Journal of Applied Physics >Confinement factor and absorption loss of AllnGaN based laser diodes emitting from ultraviolet to green
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Confinement factor and absorption loss of AllnGaN based laser diodes emitting from ultraviolet to green

机译:从紫外到绿色发射的基于AllnGaN的激光二极管的限制因子和吸收损耗

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摘要

Confinement factor and absorption loss of AllnGaN based multiquantum well laser diodes (LDs) were investigated by numerical simulation based on a two-dimensional waveguide model. The simulation results indicate that an increased ridge height of the waveguide structure can enhance the lateral optical confinement and reduce the threshold current. For 405 nm violet LDs, the effects of p-AlGaN cladding layer composition and thickness on confinement factor and absorption loss were analyzed. The experimental results are in good agreement with the simulation analysis. Compared to violet LD, the confinement factors of 450 nm blue LD and 530 nm green LD were much lower. Using InGaN as waveguide layers that has higher refractive index than GaN will effectively enhance the optical confinement for blue and green LDs. The LDs based on nonpolar substrate allow for thick well layers and will increase the confinement factor several times. Furthermore, the confinement factor is less sensitive to alloys composition of waveguide and cladding layers, being an advantage especially important for ultraviolet and green LDs.
机译:通过基于二维波导模型的数值模拟,研究了基于AllnGaN的多量子阱激光二极管(LD)的限制因子和吸收损耗。仿真结果表明,增加波导结构的脊高可以增强横向光学限制并降低阈值电流。对于405nm紫光LD,分析了p-AlGaN包覆层的组成和厚度对限制因子和吸收损耗的影响。实验结果与仿真分析吻合良好。与紫色LD相比,450 nm蓝色LD和530 nm绿色LD的限制因子要低得多。使用InGaN作为具有比GaN更高的折射率的波导层,将有效地增强蓝色和绿色LD的光学限制。基于非极性衬底的LD允许厚阱层,并且将使限制因子提高数倍。此外,限制因子对波导和包层的合金成分不太敏感,这是一个优点,对紫外线和绿色LD尤其重要。

著录项

  • 来源
    《Journal of Applied Physics 》 |2009年第1期| 0231041-0231048| 共8页
  • 作者单位

    State Key Laboratory of Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, P.O. Box 912, Beijing 100083, China;

    State Key Laboratory of Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, P.O. Box 912, Beijing 100083, China;

    State Key Laboratory of Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, P.O. Box 912, Beijing 100083, China;

    State Key Laboratory of Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, P.O. Box 912, Beijing 100083, China;

    State Key Laboratory of Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, P.O. Box 912, Beijing 100083, China;

    State Key Laboratory of Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, P.O. Box 912, Beijing 100083, China;

    Suzhou Institute of Nano-tech and Nano-bionics, Chinese Academy of Sciences, Suzhou 215123, China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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