首页> 外文期刊>Journal of Applied Physics >Modulation mechanism of infrared photoreflectance in narrow-gap HgCdTe epilayers: A pump power dependent study
【24h】

Modulation mechanism of infrared photoreflectance in narrow-gap HgCdTe epilayers: A pump power dependent study

机译:窄间隙HgCdTe外延层中红外光反射的调制机制:泵浦功率依赖性研究

获取原文
获取原文并翻译 | 示例
           

摘要

Modulation of built-in surface electric field was well established as a mechanism of photoreflectance (PR) processes in bulklike semiconductors, though pump light induced excess carrier concentration was once suggested theoretically as another possibility. In this work, pump power dependent infrared PR measurements were carried out on two arsenic-doped narrow-gap HgCdTe epilayer samples in a wide power range from about 1 mW to up to 480 mW. The relation between the integral intensity I of main PR features and pump power P can be described with I∞ P~c, and the k is sensitive to temperature and pump power. While it takes a value of about 0.5 at 11 K or under considerably high pumping power at 77 and 150 K, it is close to 1.0 in a low pump power range at 77 and 150 K. The modulation mechanism is indicated as a combination of the modulation of built-in surface electric field and the pumping induced excess carrier concentration near the band edge. The modulation of built-in surface electric field takes place when the Debye screening length is larger than the pump light penetration depth, otherwise the pumping induced excess carrier concentration also comes into force. High pump power significantly enhances the signal and improves the signal-to-noise ratio of PR spectrum especially when the pumping induced excess carrier concentration plays a dominant role and can, therefore, serve as a primary choice for performing infrared PR measurements on narrow-gap HgCdTe epilayers efficiently.
机译:内置表面电场的调制已被很好地确立为块状半导体中光反射(PR)过程的机制,尽管理论上曾提出泵浦光引起的过量载流子浓度是另一种可能。在这项工作中,在大约1 mW至最高480 mW的宽功率范围内,对两个掺砷的窄间隙HgCdTe外延层样品进行了与泵浦功率相关的红外PR测量。主要PR特征的积分强度I与泵浦功率P之间的关系可以用I∞P〜c描述,并且k对温度和泵浦功率敏感。虽然在11 K或在77和150 K的相当高的泵浦功率下取值为0.5,但在77和150 K的低泵浦功率范围内却接近1.0。调制机制表示为内置表面电场的调制和泵激在带边缘附近引起过量的载流子浓度。当Debye屏蔽长度大于泵浦光的穿透深度时,会发生内置表面电场的调制,否则泵浦引起的多余载流子浓度也会生效。高泵浦功率显着增强了PR谱的信号并改善了PR谱的信噪比,尤其是在泵浦引起的过量载流子浓度起主要作用并且因此可以作为在窄间隙上进行红外PR测量的主要选择时HgCdTe外延层有效。

著录项

  • 来源
    《Journal of Applied Physics》 |2010年第2期|P.023518.1-023518.8|共8页
  • 作者单位

    National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, 200083 Shanghai, China;

    Research Center for Advanced Materials and Devices, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, 200083 Shanghai, China;

    Department of Physics, Shanghai University, 200444 Shanghai, China;

    National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, 200083 Shanghai, China;

    National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, 200083 Shanghai, China;

    National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, 200083 Shanghai, China;

    Research Center for Advanced Materials and Devices, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, 200083 Shanghai, China;

    National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, 200083 Shanghai, China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号