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首页> 外文期刊>Journal of Applied Physics >Response to 'Comment on 'Broadening of metal-oxide-semiconductor admittance characteristics: Measurement, sources, and its effects on interface state density analyses'' [J. Appl. Phys. 112,076101]
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Response to 'Comment on 'Broadening of metal-oxide-semiconductor admittance characteristics: Measurement, sources, and its effects on interface state density analyses'' [J. Appl. Phys. 112,076101]

机译:回应“关于'扩大金属氧化物半导体导纳特性的评论:测量,来源及其对界面态密度分析的影响” [J.应用物理112,076101]

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摘要

In our opinion, there are a number of inconsistencies in the Comment by Basile and Mooney. These include the significance of the donor response in the formation of a dip in the low temperature C-V characteristics, the degree to which the donors respond to the ac signal at low temperature, and the explanation of the low temperature broadening as resulting from interface state response.
机译:我们认为,Basile和Mooney的评论中存在许多不一致之处。这些因素包括在低温CV特性下降中形成施主响应的重要性,施主在低温下对交流信号的响应程度以及对由于界面状态响应而导致的低温展宽的解释。

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  • 来源
    《Journal of Applied Physics》 |2012年第7期|p.076102.1-076102.3|共3页
  • 作者

    G. W. Paterson; A. R. Long;

  • 作者单位

    SUPA, School of Physics and Astronomy, University of Glasgow, Glasgow G12 8QQ, United Kingdom;

    SUPA, School of Physics and Astronomy, University of Glasgow, Glasgow G12 8QQ, United Kingdom;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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