机译:在GaAs上生长的可调谐器件应用中的外延Ba_(0.7)Sr_(0.3)TiO_3薄膜的面内介电特性
Department of Applied Physics and Materials Research Centre, The Hong Kong Polytechnic University,Hong Kong, People's Republic of China;
Department of Applied Physics and Materials Research Centre, The Hong Kong Polytechnic University,Hong Kong, People's Republic of China;
机译:LaAlO_3外延生长的Ba_(0.7)Sr_(0.3)TiO_3薄膜的面内电介质和铁电性能的厚度依赖性
机译:外延生长取向对在平面压缩基底上生长的(Ba_(0.3)Sr_(0.7))TiO_3薄膜的残余应变和介电性能的影响
机译:在(001)SrTiO_3衬底上生长的La_(0.7)Sr_(0.3)MnO_3 / Ba_(0.7)Sr_(0.3)TiO_3 / La_(0.7)Sr_(0.3)MnO_3外延膜的微观结构
机译:BA_(0.7)SR_(0.3)TiO_3薄膜的结构和介电性能
机译:压电瘤应用Pb(Zr0.3Ti0.7)O3薄膜对缩放效应对缩放效应的影响
机译:La0.7Sr0.3MnO3外延超薄膜中量子干涉效应中弱局部化的证据
机译:在GaAs上生长的可调谐器件应用中外延Ba₀.₇Sr₀.₃TiO₃薄膜的面内介电性能
机译:光谱椭偏法研究区域中心量子限制效应研究单(al)(0.3)Ga(0.7)as / Gaas / al(0.3)Ga(0.7)as,方形量子阱的介电函数