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Local environment of silicon in cubic boron nitride

机译:立方氮化硼中硅的局部环境

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摘要

Si-doped cubic boron nitride (c-BN) is synthesized at high pressure and high temperature, and the local environment of Si is investigated using X-ray absorption near edge structure (XANES) and first-principles calculations. Si-K XANES indicates that Si in c-BN is surrounded by four nitrogen atoms. According to first-principles calculations, the model for substitutional Si at the B site well reproduces experimental Si-K XANES, and it is energetically more favorable than substitutional Si at the N site. Both the present experimental and theoretical results indicate that Si in c-BN prefers the B site to the N site.
机译:硅掺杂的立方氮化硼(c-BN)是在高温高压下合成的,并通过近边缘结构的X射线吸收和第一性原理研究了硅的局部环境。 Si-K XANES表示c-BN中的Si被四个氮原子包围。根据第一性原理计算,B位置上的取代Si的模型很好地复制了实验Si-K XANES,并且在能量上比N位置上的取代Si更有利。目前的实验结果和理论结果均表明,c-BN中的Si比B位更喜欢N位。

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  • 来源
    《Journal of Applied Physics 》 |2013年第23期| 233502.1-233502.4| 共4页
  • 作者单位

    Advanced Key Technologies Division, National Institute for Materials Science, 1-1 Namiki Tsukuba,Ibaraki 305-0044, Japan;

    Advanced Key Technologies Division, National Institute for Materials Science, 1-1 Namiki Tsukuba,Ibaraki 305-0044, Japan;

    Environment and Energy Materials Division, National Institute for Materials Science, 1-1 Namiki Tsukuba,Ibaraki 305-0044, Japan;

    Faculty of Science and Engineering, Waseda University, 3-4-1 Okubo, Shinjuku, Tokyo 169-8555, Japan;

    Department of Materials Science and Engineering, Kyoto University, Yoshida-Honmachi, Sakyo,Kyoto 606-8501, Japan;

    Department of Materials Science and Engineering, Kyoto University, Yoshida-Honmachi, Sakyo,Kyoto 606-8501, Japan,Nanostructures Research Laboratory, Japan Fine Ceramics Center, 2-4-1 Mutsuno, Atsuta,Nagoya 456-8587, Japan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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