机译:X射线光电子能谱分析溶剂添加速率对HCl掺杂聚苯胺纳米粉体电磁屏蔽效能的化学影响
Department of Chemical & Materials Engineering, University of Idaho, 875 Perimeter MS 1021, Moscow, Idaho 83844-1021, USA;
Department of Physics, University of Idaho, Moscow, Idaho 83844, USA;
Department of Physics, University of Idaho, Moscow, Idaho 83844, USA;
School of Electrical Engineering and Computer Science, Washington State University, EME 102 Spokane St., Pullman, Washington 99164, USA;
School of Electrical Engineering and Computer Science, Washington State University, EME 102 Spokane St., Pullman, Washington 99164, USA;
Department of Physics, University of Idaho, Moscow, Idaho 83844, USA;
Department of Chemical & Materials Engineering, University of Idaho, 875 Perimeter MS 1021, Moscow, Idaho 83844-1021, USA;
机译:溶剂限制的HCl掺杂聚苯胺纳米粉合成方法的化学作用
机译:溶剂受限条件下生产的聚苯胺纳米粉对电磁屏蔽的比较
机译:基于X射线光电子能谱的纳秒电磁脉冲处理前后黄铜矿和闪锌矿表面原子组成和化学状态变化的分析
机译:X射线光电子体光谱法研究Si / C / N纳米液中的局部原子阶
机译:聚苯胺纳米粉的电磁屏蔽潜能。
机译:X射线光电子能谱分析革兰氏阳性细菌的全细胞和分离的细胞壁:与生化分析的比较。
机译:原位X射线光电子能谱用于普通溶剂中的电化学反应
机译:用二茂铁和二茂铁化学改性的金属,金属氧化物和碳电极表面的X射线光电子能谱