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首页> 外文期刊>Journal of Applied Physics >Localized absorption in aluminum mask in visible spectrum due to longitudinal modes in vertical silicon nanowire arrays
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Localized absorption in aluminum mask in visible spectrum due to longitudinal modes in vertical silicon nanowire arrays

机译:由于垂直硅纳米线阵列中的纵向模式,铝掩模在可见光谱中的局部吸收

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摘要

Localized optical absorption in aluminum masks used for vertical silicon nanowire fabrication is demonstrated experimentally and supported using computer simulations. The mask is in the form of 30 nm thick aluminum nano-disks on top of silicon nanowires arranged in square lattices. The nanowires are 1 μm long, with diameters ranging from 60 nm to 100 nm and spaced 400 nm apart. New spectral features appear in the 500 nm-700 nm wavelengths range and are dependent on both the nanowire diameter and length. The former is due to the excitation of radial modes, whereas the latter stems from longitudinal (Fabry-Perot) resonances. The salient features associated with absorption in the aluminum mask and the role nanowire plays in this connection are discussed.
机译:实验证明了用于垂直硅纳米线制造的铝掩膜中的局部光吸收,并通过计算机仿真得到支持。该掩模是在以方形点阵排列的硅纳米线顶部上的30 nm厚的铝纳米盘形式。纳米线的长度为1μm,直径范围为60 nm至100 nm,间距为400 nm。新的光谱特征出现在500 nm-700 nm波长范围内,并且取决于纳米线的直径和长度。前者归因于径向模式的激发,而后者则源于纵向(法布里-珀罗)共振。讨论了铝掩模中与吸收相关的显着特征以及纳米线在此方面的作用。

著录项

  • 来源
    《Journal of Applied Physics》 |2015年第22期|224302.1-224302.7|共7页
  • 作者单位

    Department of Electrical and Computer Engineering, Waterloo Institute of Nanotechnology, University of Waterloo, 200, University Avenue West, Waterloo, Ontario N2L 3G1, Canada;

    Department of Electrical and Computer Engineering, Waterloo Institute of Nanotechnology, University of Waterloo, 200, University Avenue West, Waterloo, Ontario N2L 3G1, Canada;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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