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Band gap engineering of MoS_2 upon compression

机译:压缩后MoS_2的带隙工程

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摘要

Molybdenum disulfide (MoS_2) is a promising candidate for 2D nanoelectronic devices, which shows a direct band-gap for monolayer structure. In this work we study the electronic structure of MoS_2 upon both compressive and tensile strains with first-principles density-functional calculations for different number of layers. The results show that the band-gap can be engineered for experimentally attainable strains (i.e., ±0.15). However, compressive strain can result in bucking that can prevent the use of large compressive strain. We then studied the stability of the compression, calculating the critical strain that results in the on-set of buckling for free-standing nanorib-bons of different lengths. The results demonstrate that short structures, or few-layer MoS_2, show semi-conductor to metal transition upon compressive strain without bucking.
机译:二硫化钼(MoS_2)是2D纳米电子器件的有希望的候选者,它显示出单层结构的直接带隙。在这项工作中,我们用第一性原理密度函数计算不同层数时,研究了压缩和拉伸应变下MoS_2的电子结构。结果表明,可以为实验上可达到的应变(即,±0.15)设计带隙。但是,压缩应变会导致弯曲,从而阻止使用大的压缩应变。然后,我们研究了压缩的稳定性,计算了导致不同长度的独立式纳米带的屈曲开始的临界应变。结果表明,短结构或几层MoS_2在压缩应变下显示出从半导体到金属的转变而没有屈曲。

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  • 来源
    《Journal of Applied Physics》 |2016年第16期|165105.1-165105.4|共4页
  • 作者单位

    NiPS Laboratory, Dipartimento di Fisica e Geologia, Universitd degli Studi di Perugia, 06123 Perugia, Italy;

    NiPS Laboratory, Dipartimento di Fisica e Geologia, Universitd degli Studi di Perugia, 06123 Perugia, Italy,INFN Sezione di Perugia, via Pascoli, 06123 Perugia, Italy;

    lnstitut de Ciencia de Materials de Barcelona (ICMAB-CS1C) Campus de Bellaterra, 08193 Bellaterra,Barcelona, Spain;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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