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机译:通过HIPIMS / DC磁控管混合溅射与同步金属离子辐照共溅射形成致密且坚硬的Ti_(0.4)Al_(0.5)Ta_(0.08)N薄膜的低温生长
Thin Film Physics Division, Department of Physics, Chemistry, and Biology (IFM), Linköping University, SE-581 83 Linkoping, Sweden;
Thin Film Physics Division, Department of Physics, Chemistry, and Biology (IFM), Linköping University, SE-581 83 Linkoping, Sweden;
Thin Film Physics Division, Department of Physics, Chemistry, and Biology (IFM), Linköping University, SE-581 83 Linkoping, Sweden;
CemeCon AG, Adenauerstr. 20 A4, D-52146 Wiirselen, Germany;
CemeCon AG, Adenauerstr. 20 A4, D-52146 Wiirselen, Germany;
CemeCon AG, Adenauerstr. 20 A4, D-52146 Wiirselen, Germany;
CemeCon AG, Adenauerstr. 20 A4, D-52146 Wiirselen, Germany;
CemeCon AG, Adenauerstr. 20 A4, D-52146 Wiirselen, Germany;
Thin Film Physics Division, Department of Physics, Chemistry, and Biology (IFM), Linköping University, SE-581 83 Linkoping, Sweden, Frederick Seitz Materials Research Laboratory and Materials Science Department, University of Illinois, 104 South Goodwin, Urbana, Illinois 61801, USA;
Thin Film Physics Division, Department of Physics, Chemistry, and Biology (IFM), Linköping University, SE-581 83 Linkoping, Sweden;
Thin Film Physics Division, Department of Physics, Chemistry, and Biology (IFM), Linköping University, SE-581 83 Linkoping, Sweden, Frederick Seitz Materials Research Laboratory and Materials Science Department, University of Illinois, 104 South Goodwin, Urbana, Illinois 61801, USA;
Thin Film Physics Division, Department of Physics, Chemistry, and Biology (IFM), Linköping University, SE-581 83 Linkoping, Sweden;
机译:Ti1-xAlxN薄膜生长过程中的金属与稀有气体离子辐照,采用同步脉冲衬底偏置的混合高功率脉冲磁控管/直流磁控管共溅射
机译:高硬度的无应变单相亚稳态Ti_(0.38)Al_(0.62)N合金:混合高功率脉冲/直流磁控共溅射膜生长过程中的金属离子能量与动量效应
机译:通过混合HIPIMS / DC-磁控管共溅射TiB2和Si靶沉积非晶Ti-B-Si-N薄膜的生长和性能
机译:通过直流反应磁控溅射和高功率脉冲磁控溅射(Hipims),织地织地织地造成的ALN薄膜的生长沉积在Si(100)上沉积在Si(100)上
机译:通过混合HIPIMS / DC磁控管共溅射与同步金属离子辐照在致密且坚硬的Ti0.41Al0.51Ta0.08N薄膜上进行低温生长