首页> 外文期刊>Journal of Analytical Atomic Spectrometry >Determination of trace sodium, lithium, magnesium, and potassium impurities in colloidal silica by slurry introduction into an atmospheric-pressure solution-cathode glow discharge and atomic emission spectrometry
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Determination of trace sodium, lithium, magnesium, and potassium impurities in colloidal silica by slurry introduction into an atmospheric-pressure solution-cathode glow discharge and atomic emission spectrometry

机译:浆液引入常压溶液-阴极辉光放电和原子发射光谱法测定胶体二氧化硅中的痕量钠,锂,镁和钾杂质

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摘要

Trace impurities of sodium, lithium, magnesium, and potassium in colloidal silica were determined by slurry introduction into an atmospheric-pressure solution-cathode glow discharge (SCGD). The applied voltage, solution flow rate, and distance between the metal anode and surface of the solution were optimized. Emission from K (766.5 nm), Na (589.0 nm), Mg (285.2 nm) and Li (670.8 nm) demonstrated a linear range of nearly 4 orders of magnitude (R~2 ≥ 0.998) and steady-state sample introduction yielded limits of detection of 0.7, 0.4, 0.5 and 0.2 ng mL~(-1), respectively. For an integration time of 0.3 s, relative standard deviations (RSDs) from 1000 ng mL~(-1) standard solutions introduced continuously were found to be better than 3% for all four elements. Transient sample introduction into the SCGD was also optimized and provided limits of detection for K, Na, Mg and Li of 3, 2, 2 and 0.8 ng mL~(-1), respectively, and RSDs for 1000 ng mL~(-1) standard solutions of better than 3%. Determined concentrations of trace impurities in colloidal silica agreed satisfactorily (accuracy from 1.3 to 7.7% and precision from 4 to 14%) with those obtained from inductively coupled plasma atomic emission spectrometry.
机译:胶体二氧化硅中的钠,锂,镁和钾中的痕量杂质是通过将浆料引入大气压溶液-阴极辉光放电(SCGD)来测定的。优化了施加电压,溶液流速以及金属阳极与溶液表面之间的距离。 K(766.5 nm),Na(589.0 nm),Mg(285.2 nm)和Li(670.8 nm)的发射表明线性范围接近4个数量级(R〜2≥0.998),并且稳态样品引入产生极限分别为0.7、0.4、0.5和0.2 ng mL〜(-1)的检测值。对于0.3 s的积分时间,发现从四个样品中连续引入的1000 ng mL〜(-1)标准溶液的相对标准偏差(RSD)均优于3%。还优化了将瞬时样品引入SCGD的方法,并提供了分别为3、2、2和0.8 ng mL〜(-1)的K,Na,Mg和Li的检出限,以及1000 ng mL〜(-1的RSDs)的检测限。 )优于3%的标准溶液。胶态二氧化硅中痕量杂质的测定浓度与电感耦合等离子体原子发射光谱法测定的结果令人满意地一致(准确度为1.3%至7.7%,精确度为4%至14%)。

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  • 来源
    《Journal of Analytical Atomic Spectrometry》 |2013年第2期|234-240|共7页
  • 作者单位

    Department of Chemistry, Indiana University, 800 East Kirhvood Avenue, Bloominton, Indiana 47405, USA Shanghai Institute of Ceramics, Chinese Academy of Sciences, Shanghai 200050, China;

    Department of Chemistry, Indiana University, 800 East Kirhvood Avenue, Bloominton, Indiana 47405, USA;

    Department of Chemistry, Indiana University, 800 East Kirhvood Avenue, Bloominton, Indiana 47405, USA;

    Department of Chemistry, Indiana University, 800 East Kirhvood Avenue, Bloominton, Indiana 47405, USA;

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  • 入库时间 2022-08-18 03:04:10

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