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Surface-Initiated Polymerization of Superhydrophobic Polymethylene

机译:超疏水聚亚甲基丙烯酸酯的表面引发聚合

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We report a new surface-initiated polymerization strategy that yields superhydrophobic polymethylene (PM) films from initially smooth substrates of gold and silicon. The films are prepared by assembling a vinyl-terminated self-assembled monolayer, followed by exposure of the surface to a 0.1 M solution of borane, and polymerizing from the borane sites upon exposure to a solution of diazomethane at −17 °C. Surface-initiated polymethylenation (SIPM) presents rapid growth in relation to other surface-initiated reactions, producing PM films thicker than 500 nm after 2 min of reaction and 3 μm after 24 h of reaction. AFM and SEM images show the presence of micro- and nanoscale features that enable the entrapment of air when exposed to water. Consistent with this result, these films exhibit advancing water contact angles greater than 160°, dramatically different than 103° measured for smooth PM films, and hysteresis values ranging from 2° to 40°, depending on the substrate and polymerization time. The superhydrophobic character of the films results in the entrapment of air at the polymer/solution interface to provide remarkable resistances greater than 1010 Ω·cm2 against the transport of aqueous redox probes and cause the film to behave as a “perfect” capacitor.
机译:我们报告了一种新的表面引发的聚合策略,该策略可从最初光滑的金和硅基板上产生超疏水性聚亚甲基(PM)膜。通过组装乙烯基封端的自组装单层膜,然后将表面暴露于0.1 M的硼烷溶液中,然后在-17°C下暴露于重氮甲烷溶液中,从硼烷部位聚合而制得薄膜。表面引发的聚亚甲基化(SIPM)相对于其他表面引发的反应呈现出快速增长的趋势,在反应2分钟后产生厚于500 nm的PM膜,在反应24小时后产生3μm的PM膜。原子力显微镜(AFM)和扫描电镜(SEM)图像显示了微米级和纳米级特征的存在,当暴露于水时,这些特征可使空气截留。与该结果一致的是,这些薄膜的前进水接触角大于160°,与光滑的PM薄膜测得的103°截然不同,其滞后值介于2°至40°之间,具体取决于基材和聚合时间。薄膜的超疏水特性导致空气滞留在聚合物/溶液界面,从而提供了大于1010Ω·cm2的显着电阻,抵抗水性氧化还原探针的传输,并导致薄膜充当“完美”电容器。

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