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Ultra-Low-Temperature Sintering of Nanostructured P-SiC

机译:纳米结构P-SiC的超低温烧结

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摘要

A nanostructured SiC was successfully obtained through the decomposition of Al_4SiC_4 additive during spark plasma sintering at the lowest temperature so far published under the pressing condition of below 121 MPa. The specimen had a relative density of 95% after sintering at 1450℃, and nearly full dens-ification with a grain size of around 70 nm was achieved at 1500℃. Heavy Al segregation occurred at the grain boundaries, which caused the low-temperature sintering most presumably by promoting grain-boundary diffusion.
机译:通过迄今为止在公布的最低温度下(在121 MPa以下)的火花等离子体烧结过程中,Al_4SiC_4添加剂的分解成功地获得了纳米结构的SiC。样品在1450℃烧结后的相对密度为95%,在1500℃时达到了约70 nm的几乎完全致密化。严重的Al偏析发生在晶界,这大概是由于促进晶界扩散而引起的低温烧结。

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    Korea Institute of Energy Research, Daejeon 305-343, Korea;

    rnKorea Institute of Energy Research, Daejeon 305-343, Korea;

    rnNational Institute for Materials Science, Tsukuba 305-0044, Japan;

    rnNational Institute for Materials Science, Tsukuba 305-0044, Japan;

    rnKorea Institute of Materials Science, Changwon 641-831, Korea;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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  • 入库时间 2022-08-17 13:39:17

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