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Wide Color Variation in SiNO Thin Films Dispersed with Precipitated TiN Nano Particles

机译:沉淀的TiN纳米颗粒分散的SiNO薄膜的宽颜色变化

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摘要

Amorphous thin films of Ti_(1-y),Si_y(N,C)) with y ≥ 0.38 were prepared by reactive sputter deposition in a nitrogen atmosphere. Thermal annealing of the films in an ammonia flow above 800℃ yielded Si(N,O) amorphous thin films dispersed with precipitated TiN nanosized particles. The film color changed with Si content y and the annealing conditions, from carrot orange to cream yellow in the as-deposited films due to their oxynitride nature, and from dark green to canary yellow and from iron blue to horizon blue at respective annealing temperatures of 800℃ and 900℃ due to metallic nature of the TiN nanosized particles precipitated in the annealing.
机译:y≥0.38的Ti_(1-y),Si_y(N,C))非晶态薄膜是通过在氮气氛中进行反应溅射沉积制备的。在高于800℃的氨流中对薄膜进行热退火,得到的Si(N,O)非晶薄膜分散有沉淀的TiN纳米颗粒。薄膜的颜色随Si含量y和退火条件的变化而变化,由于它们的氧氮化物性质,在沉积后的薄膜中从胡萝卜橙变成乳黄色,在相应的退火温度下从深绿色变成淡黄色,从铁蓝色变成地平线蓝。由于退火过程中析出的TiN纳米颗粒的金属性质,在800℃和900℃。

著录项

  • 来源
    《Journal of the American Ceramic Society》 |2014年第5期|1356-1358|共3页
  • 作者单位

    Faculty of Engineering, Hokkaido University, N13W8, Kita-ku, Sapporo 060-8628, Japan;

    Faculty of Engineering, Hokkaido University, N13W8, Kita-ku, Sapporo 060-8628, Japan;

    Faculty of Engineering, Hokkaido University, N13W8, Kita-ku, Sapporo 060-8628, Japan;

    Faculty of Engineering, Hokkaido University, N13W8, Kita-ku, Sapporo 060-8628, Japan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
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  • 入库时间 2022-08-17 13:36:58

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