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Variation-free baseline with p-polarized Brewster incidence for infrared measurement of carbon impurities in silicon wafer

机译:具有p偏振Brewster入射率的无变化基线,用于红外测量硅片中的碳杂质

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摘要

In our previous infrared transmission study, the baseline variation [H. Saito and H. Shirai, J. Electrochem. Soc. 147, 1210 (2000)] appeared near the carbon impurity band at 605cm(-1) in the normal incidence infrared spectra of silicon, This occurs because of the diminishing of multiple reflections due to the strong two-phonon absorption in the range of 610-630 cm(-1) and the difference in resistivity between the test and reference samples. To solve the problem of baseline variations, p-polarized Brewster incidence has been successfully applied to infrared measurements of carbon impurities in wafer-thick silicon samples. No baseline variations have appeared in this range, owing to the absence of multiple reflections. (C) 2018 The Japan Society of Applied Physics
机译:在我们之前的红外透射研究中,基线变化[H. Saito和H. Shirai,J.Electrochem。 Soc。 147,1210(2000)]出现在硅的法线入射红外光谱中的605cm(-1)处的碳杂质带附近,这是由于在610范围内强烈的双声子吸收导致多次反射减少所致-630 cm(-1)以及测试样品和参考样品之间的电阻率差异。为了解决基线变化的问题,p偏振Brewster入射已成功应用于红外测量晶圆厚度的硅样品中的碳杂质。由于没有多次反射,因此没有基线变化出现在该范围内。 (C)2018日本应用物理学会

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  • 来源
    《Japanese journal of applied physics 》 |2018年第12期| 121301.1-121301.3| 共3页
  • 作者

    Shirai Hiroshi;

  • 作者单位

    CoorsTek KK, Res & Dev Dept, Anal Technol Sect, Hadano, Kanagawa 2578566, Japan;

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