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Cutting Tools Nitriding in Plasma Produced by a Fast Neutral Molecule Beam

机译:快速中性分子束在等离子体中渗氮的切削刀具

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Nitrogen plasma produced by a broad beam of fast neutral nitrogen molecules in 0.12-m3 vacuum chamber has been studied and used for cutting tools nitriding. The study results prove that fast molecules play a leading role in gas ionization and plasma density is proportional to their energy, equivalent current and gas pressure. Plasma is quite nonuniform: its density is maximal within the beam and rapidly decreases beyond it. Non self-sustained glow discharge between chamber and an anode immersed in the plasma reduces plasma nonuniformity down to 10%, when discharge voltage amounts to 200-300 V, and raises plasma density by an order of magnitude. After 1 -h-long soaking in discharge plasma of isolated from the chamber and heated by 4-keV beam up to 500 °C cutting plates made of high-speed steel their microhardness rises from 950 up to 1400HV, and the mean radius of cutting edges decreases from 20 to 18nm.
机译:研究了在0.12-m3真空室中由一束快速中性氮分子产生的氮等离子体,并将其用于切削工具的氮化。研究结果证明,快速分子在气体电离中起主要作用,等离子体密度与能量,等效电流和气体压力成正比。等离子体非常不均匀:其密度在光束内最大,并在光束外迅速降低。当放电电压达到200-300 V时,腔室与浸入等离子体中的阳极之间的非自持辉光放电可将等离子体不均匀性降低至10%,并将等离子体密度提高一个数量级。在从腔室中分离出的放电等离子体中浸泡1小时,并通过4-keV光束加热到500°C,由高速钢制成的切割板后,其显微硬度从950升高到1400HV,平均切割半径边缘从20纳米减小到18纳米。

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  • 来源
    《Japanese journal of applied physics》 |2011年第8issue2期|p.08JG04.1-08JG04.4|共4页
  • 作者单位

    Moscow State University of Technology "Stankin", Vadkovsky per. 3a, Moscow, 127994, Russia;

    Moscow State University of Technology "Stankin", Vadkovsky per. 3a, Moscow, 127994, Russia;

    Moscow State University of Technology "Stankin", Vadkovsky per. 3a, Moscow, 127994, Russia;

    Moscow State University of Technology "Stankin", Vadkovsky per. 3a, Moscow, 127994, Russia;

    Moscow State University of Technology "Stankin", Vadkovsky per. 3a, Moscow, 127994, Russia;

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