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A Mean-Field Photoreaction Model for the Pretilt Generation of a Liquid Crystal on Photopolymer Layers upon Ultraviolet Exposure

机译:紫外曝光后在光敏聚合物层上液晶预倾斜生成的均场光反应模型

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摘要

We present a mean-field photoreaction model for the pretilt generation of a nematio liquid crystal (NLC) on the surfaces of photopolymers upon the exposure of ultraviolet (UV) light. The angular distribution function of photopolymer side chains, calculated in the photoreaction model, is used for determining the surface anchoring energy within the Rapini-Papoular approximation. The pretilt angle transition from the homeotropic alignment to the planar alignment of the NLC is demonstrated in two photopolymers with different alkyl chain lengths as a function of the UV exposure time. The main features of the experimental results agree well with theoretical predictions.
机译:我们提出了一种平均场光反应模型,用于在紫外线(UV)曝光后在光聚合物表面上产生预取向液晶(NLC)。在光反应模型中计算出的光聚合物侧链的角分布函数用于确定Rapini-Papoular近似中的表面锚定能。在两种具有不同烷基链长度的光敏聚合物中,证实了从NLC的垂直排列向NLC的平面排列的预倾角转变是紫外线暴露时间的函数。实验结果的主要特征与理论预测吻合良好。

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    《Japanese journal of applied physics》 |2011年第3issue1期|p.245-249|共5页
  • 作者单位

    School of Electrical Engineering, Seoul National University, Kwanak P. O. Box 34, Seoul 151-600, Korea;

    School of Electrical Engineering, Seoul National University, Kwanak P. O. Box 34, Seoul 151-600, Korea;

    School of Electrical Engineering, Seoul National University, Kwanak P. O. Box 34, Seoul 151-600, Korea;

    Department of Electronic Engineering, Hanyang University, Seoul 133-791, Korea;

    School of Electrical Engineering, Seoul National University, Kwanak P. O. Box 34, Seoul 151-600, Korea;

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