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机译:磁场下脉冲激光沉积制备的BiFeO_3多晶薄膜的铁电和压电特性
Graduate School of Engineering Science, Osaka University, Toyonaka, Osaka 560-8531, Japan;
Graduate School of Engineering, University of Hyogo, Himeji, Hyogo 671-2201, Japan;
Graduate School of Engineering Science, Osaka University, Toyonaka, Osaka 560-8531, Japan;
Graduate School of Engineering Science, Osaka University, Toyonaka, Osaka 560-8531, Japan;
Institute for NanoScience Design, Osaka University, Toyonaka, Osaka 560-8531, Japan;
机译:脉冲激光沉积法制备多晶BiFeO_3薄膜的铁电性能的重复速率依赖性
机译:脉冲激光沉积制备的La改性PbTiO_3薄膜的铁电域结构和局部压电性能
机译:脉冲激光沉积制备掺doBiFeO_3薄膜的结构,表面形态,介电和磁性能
机译:脉冲激光沉积沉积BifeO_3薄膜的铁电和铁磁性特性
机译:脉冲激光沉积制备的铁电锶(0.16)钡(0.39)铌酸盐薄膜的微波特性。
机译:脉冲激光沉积法制备MgAl2O4-(Ni0.5Zn0.5)Fe2O4薄膜的磁性和光学性质
机译:脉冲激光沉积法生长(K₀.₄₈Na₀.₄₈Li₀.₀₄)(Nb₀.₇₇₅Ta₀.222₅)O₃薄膜的铁电,压电和泄漏电流特性
机译:脉冲激光沉积处理制备铁电薄膜及其表征。