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首页> 外文期刊>Japanese journal of applied physics >Role of solvent in direct growth of gold nanostructures at the interface between focused ion beam-amorphized silicon and Au-ion-containing solution
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Role of solvent in direct growth of gold nanostructures at the interface between focused ion beam-amorphized silicon and Au-ion-containing solution

机译:溶剂在聚焦离子束非晶硅和含Au离子溶液之间的界面上金纳米结构的直接生长中的作用

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摘要

The direct growth of gold nanostructures at the interface between a focused ion beam (FIB)-amorphized silicon surface and a HAuCl_4-dissolved solution is demonstrated, and its mechanism is discussed in terms of the solvent for HAuCl_4. Gold nanostructures successfully grew when a protic solvent such as water or alcohol, which has a hydroxyl group, was used as the solvent for HAuCl_4. In contrast, no gold nanostructures were observed in the case of dimethyl sulfoxide (DMSO), an aprotic solvent having no hydroxyl group. Each protic solvent deactivates the FIB-amorphized silicon surface in the absence of Au ions. The growth of gold was inhibited when the FIB-amorphized silicon was exposed to the solvent before exposure to HAuCl_4(aq). Silicon dangling bonds, which commonly exist in amorphized silicon, seem to reduce Au ions with the participation of protic solvent molecules in the redox reaction, initiating the growth of gold. The results of time-of-flight secondary ion mass spectrometry (TOF-SIMS) also support our suggestion.
机译:演示了金纳米结构在聚焦离子束(FIB)非晶硅表面和HAuCl_4溶解溶液之间的界面上的直接生长,并从HAuCl_4的溶剂方面讨论了其机理。当使用质子性溶剂(例如具有羟基的水或酒精)作为HAuCl_4的溶剂时,金纳米结构成功生长。相反,在二甲基亚砜(DMSO)(一种没有羟基的非质子传递溶剂)的情况下,未观察到金纳米结构。在不存在金离子的情况下,每种质子溶剂都会使FIB非晶硅表面失活。当FIB非晶硅在暴露于HAuCl_4(aq)之前暴露于溶剂时,金的生长受到抑制。通常存在于非​​晶硅中的硅悬空键似乎在质子溶剂分子参与氧化还原反应时还原了金离子,从而引发了金的生长。飞行时间二次离子质谱(TOF-SIMS)的结果也支持我们的建议。

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  • 来源
    《Japanese journal of applied physics 》 |2014年第6s期| 06JF06.1-06JF06.5| 共5页
  • 作者单位

    Department of Material Chemistry, Graduate School of Engineering, Kyoto University, Kyoto 615-8510, Japan;

    Department of Material Chemistry, Graduate School of Engineering, Kyoto University, Kyoto 615-8510, Japan;

    Department of Material Chemistry, Graduate School of Engineering, Kyoto University, Kyoto 615-8510, Japan;

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