首页> 外文期刊>Japanese journal of applied physics >MOVPE growth of thick (similar to 1 mu m) InGaN on AIN/Si substrates for InGaN/Si tandem solar cells
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MOVPE growth of thick (similar to 1 mu m) InGaN on AIN/Si substrates for InGaN/Si tandem solar cells

机译:用于InGaN / Si串联太阳能电池的AIN / Si衬底上厚(约1μm)InGaN的MOVPE生长

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In order to develop key technologies for InGaN/Si two-junction tandem solar cells, MOVPE growth of thick InGaN on Si p-on-n cell structures has been studied. By clarifying the phase separation behavior of MOVPE InGaN, a thick (similar to 1 mu m) InxGa1-xN (x similar to 0.5) without phase separation is successfully grown on AlN/Si(111) wafers. A sufficient current flow for the operation of the tandem cell is obtained through n-InGaN/AlN/p-Si structures by employing the annealing of AlN/Si wafer at around 1000 degrees C in NH3 flow just before InGaN growth. The annealing of AlN/Si wafers also brings about the degradation of the underlying Si pn junction. The optimization of the annealing conditions is required to balance such favorable and unfavorable effects. (C) 2015 The Japan Society of Applied Physics
机译:为了开发InGaN / Si两结串联太阳能电池的关键技术,已经研究了在Si p-on-n电池结构上厚InGaN的MOVPE生长。通过阐明MOVPE InGaN的相分离行为,成功地在AlN / Si(111)晶片上生长了厚(约1微米)InxGa1-xN(x约0.5)且没有相分离。通过n-InGaN / AlN / p-Si结构,通过在InGaN生长之前在NH3气流中在1000摄氏度左右对AlN / Si晶片进行退火,可以通过n-InGaN / AlN / p-Si结构获得足够的电流。 AlN / Si晶片的退火也导致下面的Si pn结的退化。需要优化退火条件以平衡这种有利和不利的影响。 (C)2015年日本应用物理学会

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