Oxygen atomic density measured with a self-absorption calibrated vacuum ultraviolet absorption spectroscopy and its effect on spore etching in N-2/O-2 surface-wave plasma

摘要

A compact microwave plasma light source for vacuum ultraviolet absorption spectroscopy (VUVAS) technique was developed to measure the absolute oxygen atomic density in N-2/O-2 gas mixture surface-wave plasma. With self-absorption calibrated VUVAS technique based on the theory of resonance escape factor, the absolute oxygen atomic densities were consistently analyzed using two adjacent oxygen atom emissions at 130.22 and 130.49nm for different N-2/O-2 gas mixture ratios in surface-wave plasma (SWP). Results of the absolute oxygen atomic densities clearly indicate a strong correlation with previously observed etching results of spore-forming microorganisms under the same N-2/O-2 SWP discharge conditions. (C) 2015 The Japan Society of Applied Physics