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Structure and polarization properties of Zn-Nb films formed on steel sheet by sputtering

机译:溅射在钢板上形成的Zn-Nb薄膜的结构和极化特性

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Zn-Nb films were formed on a steel sheet by helicon plasma sputtering in an argon gas atmosphere at 1.0 Pa, at RF power of 50 W and DC power of 50 mA. The structure and polarization properties of these films were studied using EPMA, X-ray diffraction and polarization curve measurements. Zn plate-like crystals in Zn-Nb films decreased with increasing Nb content, resulting in a smooth surface over the entire film at Nb content of 30 mass percent and above. The preferred orientation plane of Zn plate-like crystals was (0002) at 0mass percent Nb, while the orientation indices of (1011) and (1010)Zn increased with rising Nb content. At 30-60 mass percent Nb, the X-ray diffraction spectra showed a halo pattern characteristic of an amorphous structure. The corrosion current of Zn-Nb films, which was determined by polarization curves in 3 percent NaCl solution, decreased with increasing Nb content to reach a minimum value at 30-60 mass percent Nb, corresponding to an amorphous structure.
机译:在1.0Pa的氩气气氛中,在50W的RF功率和50mA的DC功率下,通过螺旋等离子体溅射在钢板上形成Zn-Nb膜。使用EPMA,X射线衍射和偏振曲线测量研究了这些膜的结构和偏振特性。随着Nb含量的增加,Zn-Nb膜中的Zn板状晶体减少,当Nb含量为30质量%以上时,整个膜表面变得光滑。 Zn板状晶体的优选取向面为Nb为0质量百分比时的(0002),而(1011)和(1010)Zn的取向指数随Nb含量的增加而增加。在30-60质量%的Nb下,X射线衍射光谱显示出非晶结构的晕轮图案特征。 Zn-Nb膜的腐蚀电流(由3%NaCl溶液中的极化曲线确定)随Nb含量的增加而降低,在30-60质量%Nb时达到最小值,这对应于非晶结构。

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