首页> 外文期刊>IEICE Transactions on Electronics >Device Linearity and Gate Votage Swing Improvement by Al_0.3 Ga_0.7 As/In_0.15Ga_0.85As Double Doped-Channel Deisng
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Device Linearity and Gate Votage Swing Improvement by Al_0.3 Ga_0.7 As/In_0.15Ga_0.85As Double Doped-Channel Deisng

机译:通过Al_0.3 Ga_0.7 As / In_0.15Ga_0.85As双掺杂通道设计改善器件线性度和栅极电压摆幅

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摘要

Devices DC, RF, and Microwave power per- formances between Al_0.3Ga_0.7As/In_0.15Ga_0.85 As double doped- channel FET (D-DCFETSs), conventional doped-channel Fets (DCFETs) and HEMTs are compared with each other. Device linearity and power performance have been improved by a dou- ble doped-channel design. The D-DCFETS provides a higher current density, higher gate breakdown voltage, and improves gate operation bias range as well as frequency performance.
机译:Al_0.3Ga_0.7As / In_0.15Ga_0.85之间的设备DC,RF和微波功率性能作为双掺杂沟道FET(D-DCFETS),将传统的掺杂沟道Fets(DCFET)和HEMT进行了比较。 。双重掺杂通道设计提高了器件的线性度和功率性能。 D-DCFETS提供更高的电流密度,更高的栅极击穿电压,并改善了栅极工作偏置范围以及频率性能。

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