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A Large-Scale, Flip-Flop RAM Imitating a Logic LSI for Fast Development of Process Technology

机译:模仿逻辑LSI的大规模触发器RAM,可快速开发工艺技术

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We propose a new large-scale logic test element group (TEG), called a flip-flop RAM (FF-RAM), to improve the total process quality before and during initial mass production. It is designed to be as convenient as an SRAM for measurement and to imitate a logic LSI. We implemented a 10 Mgates FF-RAM using our 65-nm CMOS process. The FF-RAM enables us to make fail-bit maps (FBM) of logic cells because of its cell array structure as an SRAM. An FF-RAM has an additional structure to detect the open and short failure of upper metal layers. The test results show that it can detect failure locations and layers effortlessly using FBMs. We measured and analyzed it for both the cell arrays and the upper metal layers. Their results provided many important clues to improve our processes. We also measured the neutron-induced soft error rate (SER) of FF-RAM, which is becoming a serious problem as transistors become smaller. We compared the results of the neutron-induced soft error rate to those of previous generations: 180nm, 130 nm, and 90 nm. Because of this TEG, we can considerably shorten the development period for advanced CMOS technology.
机译:我们提出了一种新的大规模逻辑测试元件组(TEG),称为触发器RAM(FF-RAM),以提高初始批量生产之前和期间的总体过程质量。它被设计为与SRAM一样方便进行测量并模仿逻辑LSI。我们使用65纳米CMOS工艺实现了10 Mgates FF-RAM。 FF-RAM使我们能够制作逻辑单元的故障位映射(FBM),因为它具有作为SRAM的单元阵列结构。 FF-RAM具有额外的结构,可检测上部金属层的开路和短路故障。测试结果表明,它可以使用FBM轻松检测故障位置和层。我们对单元阵列和上部金属层进行了测量和分析。他们的结果为改善我们的流程提供了许多重要线索。我们还测量了FF-RAM的中子感应软错误率(SER),随着晶体管变得越来越小,这已成为一个严重的问题。我们将中子诱发的软错误率的结果与前几代的结果进行了比较:180nm,130nm和90nm。由于有了这种TEG,我们可以大大缩短先进CMOS技术的开发周期。

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