机译:H_3PO_4-刻蚀后制备的Ni / i-AlGaN / GaN肖特基样品的表征
Hokkaido Institute of Technology, 7-15 Maeda, Teine-ku, Sapporo, 006-8585 Japan;
Hokkaido Institute of Technology, 7-15 Maeda, Teine-ku, Sapporo, 006-8585 Japan;
Hokkaido Institute of Technology, 7-15 Maeda, Teine-ku, Sapporo, 006-8585 Japan;
Hokkaido Institute of Technology, 7-15 Maeda, Teine-ku, Sapporo, 006-8585 Japan;
GaN; AlGaN/GaN heterostructure; schottky; electrical properties; wet-etching;
机译:H_3PO_4-刻蚀后制备的Ni / i-AlGaN / GaN肖特基样品的表征
机译:H {sub} 3PCO {sub} 4-刻蚀后制备的Ni / i-AlGaN / GaN肖特基样品的表征
机译:H {sub} 3PCO {sub} 4-刻蚀后制备的Ni / i-AlGaN / GaN肖特基样品的表征
机译:沉积在中温缓冲层上Ni / GaN肖特基二极管的低频噪声特性
机译:电解密码沉积制造的Ni-Craly和Ni / Co-Craly涂料的表征
机译:超高压电子束蒸发制备的Pt / GaN肖特基二极管电学特性与温度的关系
机译:沉积在中温缓冲层上的Ni / GaN肖特基二极管上的低频噪声表征