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Interaction of bis-diethylaminosilane with a hydroxylized Si (001) surface for SiO_2 thin-film growth using density functional theory

机译:双二乙氨基硅烷与羟基化Si(001)表面相互作用用于SiO_2薄膜生长的密度泛函理论

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摘要

We studied the interaction of bis-diethylaminosilane (SiH_2[N(C_2H_5)_2]_2, BDEAS) with a hydroxylized Si (001) surface for SiO_2 thin-film growth using density functional theory (DFT). BDEAS was adsorbed on the Si surface and reacted with the H atom of hydroxyl (-OH) to produce the di-ethylaminosilane (-SiH_2[N(C_2H_5)_2], DEAS) group and di-ethylamine (NH(C_2H_5)_2, DEA). Then, DEAS was able to react with another H atom of-OH to produce DEA and to form the O-(SiH_2)-O bond at the inter-dimer, inter-row, or intra-dimer site. Among the three different sites, the intra-dimer site was the most probable when it came to forming the O-(SiH_2)-O bond.
机译:我们使用密度泛函理论(DFT)研究了用于SiO_2薄膜生长的双二乙基氨基硅烷(SiH_2 [N(C_2H_5)_2] _2,BDEAS)与羟基化Si(001)表面的相互作用。 BDEAS吸附在Si表面并与羟基(-OH)的H原子反应生成二乙氨基硅烷(-SiH_2 [N(C_2H_5)_2],DEAS)基团和二乙胺(NH(C_2H_5)_2,数据包络分析)。然后,DEAS能够与另一个OH的H原子反应生成DEA,并在二聚体间,行间或二聚体内位点形成O-(SiH_2)-O键。在三个不同的位点中,二聚体内位点最有可能形成O-(SiH_2)-O键。

著录项

  • 来源
    《電子情報通信学会技術研究報告》 |2010年第110期|p.165-168|共4页
  • 作者单位

    Department of Materials Engineering, Korea University of Technology and Education 1800 Chungjeollo, Byungchun-myeon, Cheonan, Chungnam, +82-41-560-1326, Korea;

    Department of Materials Engineering, Korea University of Technology and Education 1800 Chungjeollo, Byungchun-myeon, Cheonan, Chungnam, +82-41-560-1326, Korea;

    R&D Division, ASM Genitech Korea Ltd. Sungkongkwanldong, Sameun-ri, Jiksan-eup, Cheonan, Chungnam, +82-70-7596-7800, Korea;

    Department of Materials Engineering, Korea University of Technology and Education 1800 Chungjeollo, Byungchun-myeon, Cheonan, Chungnam, +82-41-560-1326, Korea;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    SADP; SiO_2; ALD; BDEAS; DFT;

    机译:SADP;SiO_2;ALD;BDEAS;DFT;
  • 入库时间 2022-08-18 00:33:23

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