Temperature Rise in a Birefringent Substrate by RF Discharge Plasma

摘要

Temeprature rises of a birefringent substrate (LiNbO_3) have been measured in an argon RF discharge plasma. The measurement method is based on monitoring the variation of natural birefringence with temperature by laser interferometry. Using this method, the dependence of substrate temperature rise on applied RF power and gas pressure has been investigated. The evaluation of the temperature curves shows that heatflux from the plasma towards the substrate is independent of time and temperature.