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首页> 外文期刊>IEEE Transactions on Ultrasonics, Ferroelectrics, and Frequency Control >Stability of thick film piezoresistors under large pressure cycles at elevated temperature
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Stability of thick film piezoresistors under large pressure cycles at elevated temperature

机译:高温下大压力循环下厚膜压敏电阻的稳定性

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The resistance change of ruthenium based metal-insulator-metal (MIM) thick film resistors with hydrostatic pressure exhibits excellent linearity, no hysteresis, a small temperature dependency, and an order of magnitude greater sensitivity than the longitudinal mode. The effect of long-term 10/sup 6/ hydrostatic pressure cycles (0 to /spl sim/21 MPa) at 135/spl deg/C on response linearity, sensitivity (span), and the resistance at zero pressure R/sub 0/ (offset) have been established for a commercial MIM composition. No change in linearity, sensitivity, and offset was observed up to 10/sup 4/ cycles. After 10/sup 6/ cycles the offset and sensitivity changed by less than 1% and 0.5%, respectively. Other parameters remained unchanged. The results are analyzed in terms of conduction models of this system.
机译:钌基金属-绝缘体-金属(MIM)厚膜电阻器具有静水压力的电阻变化具有优异的线性度,无磁滞,温度依赖性小,并且灵敏度比纵向模式高一个数量级。在135 / spl deg / C下长期10 / sup 6 /静水压力循环(0到/ spl sim / 21 MPa)对响应线性,灵敏度(span)和零压力下电阻R / sub 0的影响/(偏移)已针对商业MIM合成建立。直到10 / sup 4 /个周期,线性,灵敏度和偏移都没有观察到变化。在10 / sup 6 /周期后,偏移和灵敏度分别变化不到1%和0.5%。其他参数保持不变。根据该系统的传导模型分析结果。

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