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A DC SQUID with intrinsically shunted submicron junctions near the hysteretic limit exhibiting an extremely large dV/d phi transfer function

机译:具有在磁滞极限附近固有分流的亚微米结的DC SQUID具有非常大的dV / d phi传递函数

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A fabrication process yielding submicron-scale Josephson junctions has been developed. The junction consists of two metal striplines lying in line and separated by a vertical barrier. Thus the contact area is determined by the width and thickness of the striplines. The capacitive coupling is only due to the small contact area, because there is no layer overlap. The process was applied to all-Nb thin-film junction technology with nitrided Si barriers. The I-V (current-voltage) curves of these junctions show the characteristic features of superconductor-normal-superconductor contacts. DC SQUIDs (superconducting quantum interference devices) made of these junctions exhibit characteristics competitive with those of high-quality tunnel-junction DC SQUIDs.
机译:已经开发出产生亚微米级约瑟夫森结的制造工艺。接合处由两条金属带状线组成,这些金属带状线排成一条线并由垂直屏障隔开。因此,接触区域由带状线的宽度和厚度确定。电容耦合仅是由于接触面积小,因为没有层重叠。该工艺已应用于具有氮化硅势垒的全Nb薄膜结技术。这些结的I-V(电流-电压)曲线显示了超导体-正常-超导体触点的特征。由这些结制成的DC SQUID(超导量子干涉器件)具有与高质量隧道结DC SQUID竞争的特性。

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